SpitLight EVO

Information
The SpitLight EVO series is for all applications demanding high pulse power and high repetition rates at the same time. The result is a high average power system (up to 100 W) with a fair size to power ratio.
datasheet SpitLight EVO (PDF)
  1. EVO I
  2. EVO II
  3. EVO III
  4. EVO IV
  5. Features
  6. Drawings
  7. Options
  Repetition Rate Pulse Energy
(@ 1064 nm)		 Pulse Energy
(@ 532 nm)		 Pulse Energy
(@ 355 nm)		 Max. Avg. Power
(@ 1064 nm)		 Stability RMS
(@ 1064 nm)
DPSS EVO I - 100 100 Hz > 180 mJ > 100 mJ > 70 mJ 20 W < 0.3 %
DPSS EVO I - 200 200 Hz > 140 mJ > 70 mJ > 40 mJ 20 W < 0.4 %
DPSS EVO I - 500 500 Hz > 40 mJ > 20 mJ > 10 mJ 20 W < 0.6 %
  Repetition Rate Pulse Energy
(@ 1064 nm)		 Pulse Energy
(@ 532 nm)		 Pulse Energy
(@ 355 nm)		 Max. Avg. Power
(@ 1064 nm)		 Stability RMS
(@ 1064 nm)
DPSS EVO II - 100 100 Hz > 350 mJ > 200 mJ > 120 mJ 45 W < 0.3 %
DPSS EVO II - 200 200 Hz > 280 mJ > 140 mJ > 100 mJ 44 W < 0.5 %
DPSS EVO II - 500 500 Hz > 80 mJ > 35 mJ > 20 mJ 40W < 0.6 %
  Repetition Rate Pulse Energy
(@ 1064 nm)		 Pulse Energy
(@ 532 nm)		 Pulse Energy
(@ 355 nm)		 Max. Avg. Power
(@ 1064 nm)		 Stability RMS
(@ 1064 nm)
DPSS EVO III - 100 100 Hz > 600 mJ > 320 mJ > 220 mJ 70 W < 0.3%
DPSS EVO III - 200 200 Hz > 450 mJ > 220 mJ > 150 mJ 70 W < 0.5 %
DPSS EVO III - 500 500 Hz > 150 mJ > 75 mJ > 50 mJ 70 W < 0.6 %
  Repetition Rate Pulse Energy
(@ 1064 nm)		 Pulse Energy
(@ 532 nm)		 Pulse Energy
(355 nm)		 Max. Avg. Power
(@ 1064 nm)		 Stability RMS
(@ 1064 nm)
DPSS EVO IV - 100 100 Hz > 1000 mJ > 600 mJ > 360 mJ 100 W < 0.3 %
  • Up to 100 W average power (1 J @ 100 Hz)
  • Versions with improved pulse-to-pulse stability and smooth gaussian beam profi le available
  • Reliable high-rep-rate performance with up to 1 kHz
  • Marketleading diode lifetime
  • Excellent size-to-power ratio
  • Robust and stable monolithic design
  • Easy scalability: EVO I to IV
  • System can be injection seeded
Image
drawing EVO I (PDF) (PDF)
drawing EVO II / III (PDF) (PDF)
drawing EVO IV (PDF) (PDF)
  • Seeder
  • Energy monitor
  • Pointing laser
  • External shutter
  • Double pulse
  • Attenuator
  • Mechanical customization